Adisyn’s (ASX: AI1) subsidiary, 2D Generation, has finalised the installation, commissioning, and calibration of a Beneq TFS 200 atomic layer deposition (ALD) system at the Jan Koum Centre for Nanoscience and Nanotechnology in Israel. This project follows infrastructure upgrades at the centre to support the precision demands of ALD-based research. Adisyn focuses on developing and commercialising innovative technology solutions. Its subsidiary, 2D Generation, is working to advance graphene applications in semiconductors.
The Beneq TFS 200 model features customisations, including plasma options for wafer surface treatments, reactive gas introduction for graphene growth, and a semi-automatic load and lock for sample exchange. Its reaction chamber is suited for wafer-scale processing, essential for advancing the company’s proprietary low-temperature graphene deposition process. This process aims to overcome performance barriers in semiconductor interconnects.
The ALD system will operate alongside an existing Beneq TFS 200 at the Tel Aviv University-based research centre. This dual-system configuration will enable 2D Generation to conduct concurrent testing and accelerate the validation of graphene films across various substrates and operating conditions. With both systems now operational, the company aims to validate previous technical results and expand its understanding for a scalable process.
Adisyn chair Kevin Crofton said the commissioning of the new ALD system marks a major operational advancement for the company. He added that the platform’s precision and flexibility would allow for rigorous testing of their graphene interconnect solution under real-world semiconductor conditions. The dual-platform setup will accelerate development, validate performance, and build a strong foundation for commercial application.
